JOURNAL OF SHANDONG UNIVERSITY (ENGINEERING SCIENCE) ›› 2017, Vol. 47 ›› Issue (1): 97-103.doi: 10.6040/j.issn.1672-3961.0.2016.313

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Image distortion correction technology of mask image projection stereolithography

JIA Hongshuai1,2, ZHAO Xuejin3, HU Tianliang2*, ZHANG Chengrui1   

  1. 1. School of Mechanical Engineering, Shandong University, Jinan 250061, Shandong, China;
    2. Suzhou Research Institute, Shandong University, Suzhou 215123, Jiangsu, China;
    3. School of Electromechanical Engineering, China University of Petroleum, Qingdao 266580, Shandong, China
  • Received:2016-08-18 Online:2017-02-20 Published:2016-08-18

Abstract: In order to solve image distortion problem when image was projected from image generation device in Mask-image-projection-based stereolithography, a distortion correction method was proposed. Image processing method was used to get pixel position on the projection plane. Predistortion mask image was generated by the intersection operation of 2D contours with pixel actual coordinates. Homogenization of irradiance was achieved by selecting linear interpolation algorithm and bilinear interpolation algorithm according to different pixel position on the projection plane. The experiment results showed that the difference between maximum and minimum irradiance measured value was less than 0.4×100 uW/cm2 and the size error was 0.05 mm, which showed that the designed method was effective and machining accuracy was obviously improved.

Key words: optical manufacturing, mask image projection, stereolithography, distortion correction, irradiance uniformity

CLC Number: 

  • TH161
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