粉末溅射金属氧化物气敏薄膜和元件Ⅰ. 粉末溅射金属氧化物气敏薄膜

山东大学学报(工学版)

粉末溅射金属氧化物气敏薄膜和元件Ⅰ. 粉末溅射金属氧化物气敏薄膜

田芳¹, 郭晓丽², 张颖欣², 王倩², 裘南畹³

1. 山东大学化学与化工学院, 山东济南 250100; 2. 济南半导体实验所, 山东济南 250100;
3. 山东大学物理学院, 山东济南 250100

收稿日期:2008-04-12 修回日期:1900-01-01 出版日期:2008-10-16 发布日期:2008-10-16
通讯作者: 田芳

Powder sputter metal oxide gas thin film and sensorsⅠ. Powder sputter metal oxide gas thin film

TIAN Fang¹, GUO Xiao-li², ZHANG Ying-xin², WANG Qian², QIU Nan-wan³

1. School of Chemistry and Chemical Engineering, Shandong University, Jinan 250100, China;
2. Jinan SemiConduction Institute, Jinan 250100, China;
3. School of Physics, Shandong University, Jinan 250100, China

Received:2008-04-12 Revised:1900-01-01 Online:2008-10-16 Published:2008-10-16
Contact: TIAN Fang

摘要/Abstract

摘要： 利用反溅,发展了粉末溅射工艺；指出了粉末溅射对研制稳定的薄膜气敏元件的重要性；给出了粉末掺杂比与薄膜掺杂比关系的实验结果;给出了SnO₂(100~x)／CeO₂(x)最佳灵敏度的掺杂x％的范围;给出了灵敏度随膜厚变化的特征,以及一些薄膜的最佳膜厚lx的数值;给出了响应时间随膜厚变化的规律.

关键词: 粉末溅射, 最佳膜厚, 响应时间

Abstract:

The technique of powder sputter was developed, and the importance of this technique for fabricating a stable film gas sensor was put forth. The relation between the ratio of impurity in powder and in film, the range of deposition impurity x％ for optimum sensitivity with film thickness, the optimum film thickness l* for some thin film, and the rule for response time varies with film thickness were given.

Key words: powder sputter, optimum film thickness, response time

中图分类号:

TF123

田芳,郭晓丽,张颖欣,王倩,裘南畹 . 粉末溅射金属氧化物气敏薄膜和元件Ⅰ. 粉末溅射金属氧化物气敏薄膜[J]. 山东大学学报(工学版), 2008, 38(5): 99-101 .

TIAN Fang,GUO Xiao-li,ZHANG Ying-xin,WANG Qian,QIU Nan-wan . Powder sputter metal oxide gas thin film and sensorsⅠ. Powder sputter metal oxide gas thin film
[J]. JOURNAL OF SHANDONG UNIVERSITY (ENGINEERING SCIENCE), 2008, 38(5): 99-101 .

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