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The reaction kinetics theory and the EF variation range of ntype metal oxide

YUAN Qinghua1，LIU Xiaojian2，LI Lei1,QIU Nanyuan1   

  1. 1.School of Physics and Microelectronics,Shandong University,Jinan 250061,China；2. Institute of Semiconductor of Jinan,Jinan 250011,China
  • Received:2004-12-07 Revised:1900-01-01 Online:2006-08-24 Published:2006-08-24
  • Contact: YUAN Qinghua

Abstract: Firstly, a theory to study the statistical distribution of concentration of semiconductor pointdefects is presented by means of reactionkinetics; Sencondly, by using this theory, the Fermi level EF of the ntype oxide with two donor levels is studied, and the lower limit EFm is given by Ed2-RTln2; Thirdly, the upper limit EFm is estimated by the solution of Poisson's equation and neutral equation, and gives EFM=Ed1-RTln2.

Key words: Fermi level, point defect , reaction kinetics

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