关键词: 电子束, 反差, Monte Carlo模拟

Abstract: In order to determine the contrast of electron beam resist more precisely, the electron beam scattering in solid is simulated with the optimized model of electron beam scattering and modified Monte Carlo algorithm to obtain the energy deposition of different exposure in resist. Then combining with the distribution density of electron and making use of the definition of contrast, a simple model for contrast calculation is proposed. The comparison between the calculations and the experiment results reveals that the agreement is good. The calculations for different exposure conditions show that the contrast will decrease with the increase in incident energy, and that the contrast will increase with the increase in resist thickness.

Key words: contrast, Monte Carlo simulation , electron beam